Dynamic Monte Carlo Simulation Software (SASAMAL)
It is possible to perform calculations related to ion implantation or the sputtering phenomenon itself!
The "Dynamic Monte Carlo Simulation Software (SASAMAL)" is a simulation code based on the Monte Carlo method using two-body collision approximation. It calculates the sputtering rate when high-energy ions are incident on an amorphous target, the angular distribution and energy distribution of sputtered atoms, the percentage of backscattering of incident particles, their angular distribution and energy distribution, and the penetration depth of ions into the target (Depth Profile). It can be used to evaluate the ion energy dependence and incident angle dependence of sputtering rates for various materials, as well as to assess the surface modification processes of materials due to ion implantation. 【Features】 ■ Even when used alone, this product can perform calculations related to ion implantation or the sputtering phenomenon itself. ■ When combined with PIC-MCCM or DSMCM, it is possible to investigate the effects of a wide range of device parameters. ■ It can also evaluate the relationship between gas pressure in the device and sputtering rate. *For more details, please refer to the PDF materials or feel free to contact us.
- Company：ペガサスソフトウェア
- Price：Other
